Low temperature epitaxial regrowth of mercury implanted sapphire
نویسندگان
چکیده
منابع مشابه
lon implantation and lo.w-temperature epitaxial regrowth of GaAs
Channeling and transmission electron microscopy have been used to investigate the parameters that govern the extent of damage in ion-implanted GaAs and the crystal quality following capless furnace annealing at low temperature ( -400 •q. The implantation-induced disorder showed a strong dependence on the implanted ion mass and on the substrate temperature during implantation. When the implantat...
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ژورنال
عنوان ژورنال: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
سال: 1996
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(96)00519-8